Publications

Haystack publications across all research areas: astronomy, geodesy, geospace and atmospheric science, and space technology. Publications listed here each include at least one Haystack author.

3072 Results found

Linking the HIPPARCOS catalog to the VLBI inertial reference system high angular resolution structures and VLBI positions of 10 radio stars. Processing of Scientific Data from the ESA Astrometry Satellite HIPPARCOS. (1985). BIBCODE: https://ui.adsabs.harvard.edu/abs/1985psde.conf…87L

Asymptotic theory of ion conic distributions. Physics of Fluids. (1985). DOI: https://doi.org/10.1063/1.865244

A novel x-ray photoelectron spectroscopy study of the Al/SiO2 interface. Journal of Applied Physics. (1985). DOI: https://doi.org/10.1063/1.335266

Extended X-Ray Absorption Fine Structure in Photoelectron Emission. Physical Review Letters. (1984). DOI: https://doi.org/10.1103/PhysRevLett.53.1183

Electron escape depth variation in thin SiO2 films measured with variable photon energy. Journal of Vacuum Science Technology A: Vacuum Surfaces and Films. (1984). DOI: https://doi.org/10.1116/1.572450

X-ray photoelectron spectroscopy study of the chemical structure of thermally nitrided SiO2. Applied Physics Letters. (1984). DOI: https://doi.org/10.1063/1.94614

Intrinsic surface binding energy shifts in Yb metal. Journal of Electron Spectroscopy and Related Phenomena. (1984). DOI: https://doi.org/10.1016/0368-2048(84)80048-1

Electron escape depth variation in thin SiO2 films measured with variable photon energy. Journal of Vacuum Science Technology. (1984). BIBCODE: https://ui.adsabs.harvard.edu/abs/1984JVST….2..584H

X-ray photoelectron spectroscopy study of the chemical structure of thermally nitrided SiO2. Applied Physics Letters. (1984). DOI: https://doi.org/10.1063/1.94614

Electron escape depth variation in thin SiO2 films measured with variable photon energy. Journal of Vacuum Science Technology. (1984). BIBCODE: https://ui.adsabs.harvard.edu/abs/1984JVST….2..584H

X-ray photoelectron spectroscopy study of the chemical structure of thermally nitrided SiO2. Applied Physics Letters. (1984). DOI: https://doi.org/10.1063/1.94614

Electron escape depth variation in thin SiO2 films measured with variable photon energy. Journal of Vacuum Science Technology. (1984). BIBCODE: https://ui.adsabs.harvard.edu/abs/1984JVST….2..584H

X-ray photoelectron spectroscopy study of the chemical structure of thermally nitrided SiO2. Applied Physics Letters. (1984). DOI: https://doi.org/10.1063/1.94614

Electron escape depth variation in thin SiO2 films measured with variable photon energy. Journal of Vacuum Science Technology. (1984). BIBCODE: https://ui.adsabs.harvard.edu/abs/1984JVST….2..584H

X-ray photoelectron spectroscopy study of the chemical structure of thermally nitrided SiO2. Applied Physics Letters. (1984). DOI: https://doi.org/10.1063/1.94614

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