Publications

Haystack publications across all research areas: astronomy, geodesy, geospace and atmospheric science, and space technology. Publications listed here each include at least one Haystack author.

2990 Results found

Electron escape depth variation in thin SiO2 films measured with variable photon energy. Journal of Vacuum Science Technology A: Vacuum Surfaces and Films. (1984). DOI: https://doi.org/10.1116/1.572450

X-ray photoelectron spectroscopy study of the chemical structure of thermally nitrided SiO2. Applied Physics Letters. (1984). DOI: https://doi.org/10.1063/1.94614

Intrinsic surface binding energy shifts in Yb metal. Journal of Electron Spectroscopy and Related Phenomena. (1984). DOI: https://doi.org/10.1016/0368-2048(84)80048-1

Electron escape depth variation in thin SiO2 films measured with variable photon energy. Journal of Vacuum Science Technology. (1984). BIBCODE: https://ui.adsabs.harvard.edu/abs/1984JVST….2..584H

X-ray photoelectron spectroscopy study of the chemical structure of thermally nitrided SiO2. Applied Physics Letters. (1984). DOI: https://doi.org/10.1063/1.94614

Electron escape depth variation in thin SiO2 films measured with variable photon energy. Journal of Vacuum Science Technology. (1984). BIBCODE: https://ui.adsabs.harvard.edu/abs/1984JVST….2..584H

X-ray photoelectron spectroscopy study of the chemical structure of thermally nitrided SiO2. Applied Physics Letters. (1984). DOI: https://doi.org/10.1063/1.94614

Electron escape depth variation in thin SiO2 films measured with variable photon energy. Journal of Vacuum Science Technology. (1984). BIBCODE: https://ui.adsabs.harvard.edu/abs/1984JVST….2..584H

X-ray photoelectron spectroscopy study of the chemical structure of thermally nitrided SiO2. Applied Physics Letters. (1984). DOI: https://doi.org/10.1063/1.94614

Electron escape depth variation in thin SiO2 films measured with variable photon energy. Journal of Vacuum Science Technology. (1984). BIBCODE: https://ui.adsabs.harvard.edu/abs/1984JVST….2..584H

X-ray photoelectron spectroscopy study of the chemical structure of thermally nitrided SiO2. Applied Physics Letters. (1984). DOI: https://doi.org/10.1063/1.94614

Electron escape depth variation in thin SiO2 films measured with variable photon energy. Journal of Vacuum Science Technology. (1984). BIBCODE: https://ui.adsabs.harvard.edu/abs/1984JVST….2..584H

X-ray photoelectron spectroscopy study of the chemical structure of thermally nitrided SiO2. Applied Physics Letters. (1984). DOI: https://doi.org/10.1063/1.94614

Electron escape depth variation in thin SiO2 films measured with variable photon energy. Journal of Vacuum Science Technology. (1984). BIBCODE: https://ui.adsabs.harvard.edu/abs/1984JVST….2..584H

X-ray photoelectron spectroscopy study of the chemical structure of thermally nitrided SiO2. Applied Physics Letters. (1984). DOI: https://doi.org/10.1063/1.94614

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