Publications

Haystack publications across all research areas: astronomy, geodesy, geospace and atmospheric science, and space technology. Publications listed here each include at least one Haystack author.
2946 Results found

Extended X-Ray Absorption Fine Structure in Photoelectron Emission. Physical Review Letters. (1984). DOI: https://doi.org/10.1103/PhysRevLett.53.1183

Electron escape depth variation in thin SiO2 films measured with variable photon energy. Journal of Vacuum Science Technology A: Vacuum Surfaces and Films. (1984). DOI: https://doi.org/10.1116/1.572450

X-ray photoelectron spectroscopy study of the chemical structure of thermally nitrided SiO2. Applied Physics Letters. (1984). DOI: https://doi.org/10.1063/1.94614

Intrinsic surface binding energy shifts in Yb metal. Journal of Electron Spectroscopy and Related Phenomena. (1984). DOI: https://doi.org/10.1016/0368-2048(84)80048-1

Electron escape depth variation in thin SiO2 films measured with variable photon energy. Journal of Vacuum Science Technology. (1984). BIBCODE: https://ui.adsabs.harvard.edu/abs/1984JVST….2..584H

X-ray photoelectron spectroscopy study of the chemical structure of thermally nitrided SiO2. Applied Physics Letters. (1984). DOI: https://doi.org/10.1063/1.94614

Electron escape depth variation in thin SiO2 films measured with variable photon energy. Journal of Vacuum Science Technology. (1984). BIBCODE: https://ui.adsabs.harvard.edu/abs/1984JVST….2..584H

X-ray photoelectron spectroscopy study of the chemical structure of thermally nitrided SiO2. Applied Physics Letters. (1984). DOI: https://doi.org/10.1063/1.94614

Electron escape depth variation in thin SiO2 films measured with variable photon energy. Journal of Vacuum Science Technology. (1984). BIBCODE: https://ui.adsabs.harvard.edu/abs/1984JVST….2..584H

X-ray photoelectron spectroscopy study of the chemical structure of thermally nitrided SiO2. Applied Physics Letters. (1984). DOI: https://doi.org/10.1063/1.94614

Electron escape depth variation in thin SiO2 films measured with variable photon energy. Journal of Vacuum Science Technology. (1984). BIBCODE: https://ui.adsabs.harvard.edu/abs/1984JVST….2..584H

X-ray photoelectron spectroscopy study of the chemical structure of thermally nitrided SiO2. Applied Physics Letters. (1984). DOI: https://doi.org/10.1063/1.94614

Electron escape depth variation in thin SiO2 films measured with variable photon energy. Journal of Vacuum Science Technology. (1984). BIBCODE: https://ui.adsabs.harvard.edu/abs/1984JVST….2..584H

X-ray photoelectron spectroscopy study of the chemical structure of thermally nitrided SiO2. Applied Physics Letters. (1984). DOI: https://doi.org/10.1063/1.94614

Electron escape depth variation in thin SiO2 films measured with variable photon energy. Journal of Vacuum Science Technology. (1984). BIBCODE: https://ui.adsabs.harvard.edu/abs/1984JVST….2..584H

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